Small vacuum high temperature furnace

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Product introduction of small vacuum high temperature furnace:

The vacuum annealing furnace is a tabletop high vacuum annealing device of SIMUWU. The most prominent feature is that the pressure control resolution is as low as 0.1 mbar. It is an ideal choice for the annealing of two-dimensional materials and thin films.

Product characteristics and main parameters of small vacuum high temperature furnace:

• tabletop vacuum annealing device

• maximum sample size: 6 “or 4” wafers

• there are two options for temperature:

1) 1000℃ : the heating material is graphite material of SIC coating or CCC material, the resolution is ±1℃.

2) 600℃ high temperature: quartz lamp heating, compatible with the general air environment, cheap, resolution ±1℃.

• high precision gas control: 3 channels of gas control: Ar, O2 and N2 can be supported when annealing, mass flow rate can be controlled.

• very high resolution pressure automatic control: as low as 0.1mbar, annealing is the pressure and the control is crucial, especially for two-dimensional materials, nanometer thin film materials, the more accurate the pressure control, the better.

• the vacuum degree is low to <5 × 10-7 mbar

• simple operation

• can customize annealing program and has storage function

• simple maintenance

• safe operation, with various safety protection devices

• compatible with ultra-clean rooms

Application of small vacuum high temperature furnace:

• annealing treatment of nano films.

• annealing treatment of two-dimensional materials.

• metal materials, ceramic materials, etc.